AnyBook4Less.com - ISBN: 1558994742 - Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposia Proceedings, Vol 567) by H. R. Huff

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Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposia Proceedings, Vol 567)

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Title: Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposia Proceedings, Vol 567)
by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, T. Hattori
ISBN: 1-55899-474-2
Publisher: Material Research Society
Pub. Date: February, 2000
Format: Hardcover
Volumes: 1
List Price(USD): $75.00

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