AnyBook4Less.com	Find the Best Price on the Web Order from a Major Online Bookstore
Home  |  Store List  |  FAQ  |  Contact Us  |
Ultimate Book Price Comparison Engine Save Your Time And Money Keyword AuthorISBN

Title: Silicon Processing for the VLSI Era, Vol. 4: Deep-Submicron Process Technology by Stanley Wolf ISBN: 0-9616721-7-X Publisher: Lattice Press Pub. Date: May, 2002 Format: Hardcover Volumes: 1 List Price(USD): $229.95

Your Country USA Canada United Kingdom Australia Austria Belgium France Germany Italy Netherlands Switzerland Currency AutoUSD CAD GBP EUR AUD CHF Delivery Only cheapest delivery All delivery options Include Used Books Are you a club member of: Barnes and Noble Books A Million Chapters.Indigo.ca

Average Customer Rating: 4.5 (2 reviews)

Rating: 4
Summary: Excellent review on the recent semiconductor processing
Comment: This book collects the hot issues on the very recent deep submicron (less than 0.18um) semiconductor process technology, such as EUV lithography, high and low k materials, CMP, and 300mm wafer. It seems to provide a good guideline to anyone who wonders what it is going on in the semiconductor process industry.

Rating: 5
Summary: THE LATEST IN AN EXCELLENT SERIES
Comment: This well written reference book is highly recommended to anyone interested in the technology used to manufacture deep-submicron MOSFETs, i.e., MOSFETs requiring lithography in the 1/4 to 1/8-micron range. The first chapter nicely identifies several practical problems that appeared during the evolution of the MOSFET to ULSI, and the remainder of the book discusses processing solutions to those problems.

Major processing topics include thin gate oxides, self-aligned silicides, high- and low-k dielectrics, double and triple level metal interconnects, dual damascene copper interconnects, copper seed and electroplating technology, deep uv photoresists and tools, chemical-mechanical planarization, and processing issues unique to 300-mm wafers. State of the art CMOS topics including super-steep retrograde channel doping, punchthrough-control implants, source/drain engineering, shallow trench isolation, and more are used to illustrate the integration of deep-submicron processes into manufacturing. Increasing use of Si-Ge heterojunction bipolar transistors and silicon-on-insulator is anticipated and discussed.

This up-to-date book is one of a kind. It is simply required reading for those in the business.

Similar Books:

	Title: Silicon Processing for the VLSI Era, Vol. 1: Process Technology by Stanley Wolf, Richard N. Tauber ISBN: 0961672161 Publisher: Lattice Press Pub. Date: 01 November, 1999 List Price(USD): $229.95
	Title: Silicon Processing for the VLSI Era, Vol. 3: The Submicron MOSFET by Stanley Wolf ISBN: 0961672153 Publisher: Lattice Press Pub. Date: 01 October, 1994 List Price(USD): $159.95
	Title: Semiconductor Material and Device Characterization by Dieter K. Schroder ISBN: 0471241393 Publisher: Wiley-Interscience Pub. Date: 19 June, 1998 List Price(USD): $125.00
	Title: Semiconductor Manufacturing Technology by Michael Quirk, Julian Serda ISBN: 0130815209 Publisher: Pearson Education Pub. Date: 15 December, 2000 List Price(USD): $127.00
	Title: Fundamentals of Modern VLSI Devices by Yuan Taur, Tak H. Ning ISBN: 0521559596 Publisher: Cambridge University Press Pub. Date: 13 October, 1998 List Price(USD): $55.00