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Title: Handbook of Vacuum Arc Science and Technology: Fundamentals and Applications (Materials Science and Process Technology Series) by R. L. Boxman, David Sanders, Philip J. Martin ISBN: 0-8155-1375-5 Publisher: Noyes Publications Pub. Date: January, 1996 Format: Hardcover Volumes: 1 List Price(USD): $152.00

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Average Customer Rating: 5 (1 review)

Rating: 5
Summary: Review of Handbook of Vacuum Arc Science
Comment: This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.