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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications : Modeling of Film Deposition for Microelectronic Applications

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Title: Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications : Modeling of Film Deposition for Microelectronic Applications
by Stephen Rossnagel, Abraham Ulman, Maurice H. Francombe
ISBN: 0-12-533022-7
Publisher: Academic Press
Pub. Date: 22 October, 1996
Format: Hardcover
Volumes: 1
List Price(USD): $195.95

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